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Nano technology generally refers to techniques for forming shapes several nm to several hundreds of nm in size. "Nano work" (1nm = 10-9m) requires 1000 times the precision of "micro work" (1mm = 10-6m).
Focusing on sensors, Panasonic Electric Works has pursued the development of bulk MEMS technology that shapes an entire silicon wafer three-dimensionally. This technology includes advanced techniques such as high aspect ratio etching (meaning that the depth of the trench is greater than the width), through-hole formation, high-precision fabrication using SOI (Silicon on Insulator, i.e. bonded boards), and the joining of silicon wafers to glass wafers.
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